Dr. Byung-Sung Kim
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (6)

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79730C (2011) https://doi.org/10.1117/12.879703
KEYWORDS: Source mask optimization, Photomasks, Resolution enhancement technologies, Optical proximity correction, Tolerancing, Optical lithography, SRAF, Image processing, Lithography, Semiconducting wafers

Proceedings Article | 3 April 2010 Open Access Paper
Lars Liebmann, Jongwook Kye, Byung-Sung Kim, Lei Yuan, Jean-Pierre Geronimi
Proceedings Volume 7641, 764105 (2010) https://doi.org/10.1117/12.847222
KEYWORDS: Optical lithography, Photomasks, Semiconducting wafers, Image quality, Lithography, Image processing, Semiconductors, Double patterning technology, Second-harmonic generation, Lithographic illumination

Proceedings Article | 9 June 2009 Paper
Proceedings Volume 7379, 73791M (2009) https://doi.org/10.1117/12.824299
KEYWORDS: Photomasks, Lithography, Inspection, Logic, Manufacturing, Optical proximity correction, Model-based design, Scanning electron microscopy, Image processing, Systems modeling

Proceedings Article | 17 October 2008 Paper
Byung-Sung Kim, Yoo-Hyun Kim, Sung-Ho Lee, Sung-Il Kim, Sang-Rok Ha, Juhwan Kim, Alexander Tritchkov
Proceedings Volume 7122, 71220T (2008) https://doi.org/10.1117/12.801310
KEYWORDS: SRAF, Photomasks, Manufacturing, Optical proximity correction, Lithography, Photovoltaics, Semiconducting wafers, Double patterning technology, Image enhancement, Logic

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 692411 (2008) https://doi.org/10.1117/12.772766
KEYWORDS: Calibration, Data modeling, Photoresist processing, Semiconducting wafers, Critical dimension metrology, Photomasks, Error analysis, Process modeling, Computer simulations, Wafer-level optics

Showing 5 of 6 publications
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