Dr. Byung-Sung Kim
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Optical lithography, Image processing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Semiconducting wafers, Tolerancing, Resolution enhancement technologies

Proceedings Article | 3 April 2010 Paper
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: Semiconductors, Lithography, Second-harmonic generation, Optical lithography, Lithographic illumination, Image processing, Image quality, Photomasks, Double patterning technology, Semiconducting wafers

Proceedings Article | 9 June 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Logic, Image processing, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, Systems modeling, Model-based design

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Photovoltaics, Logic, Manufacturing, Photomasks, Image enhancement, Double patterning technology, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Wafer-level optics, Data modeling, Calibration, Error analysis, Computer simulations, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Process modeling

Showing 5 of 6 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top