Dr. Byung-Sup Ahn
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Modulation, Data processing, Photomasks, Computer aided design

PROCEEDINGS ARTICLE | October 3, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Electron beam lithography, Electron beams, Optical lithography, Modulation, Distortion, Image registration, Photomasks, Optical simulations, Neodymium, Vestigial sideband modulation

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Electron beam lithography, Scattering, Metals, Laser scattering, Monte Carlo methods, Ion beams, Ray tracing, Photomasks, Extreme ultraviolet, Molybdenum

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Defect detection, Particles, Inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, High volume manufacturing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Inspection, Atomic force microscopy, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Visibility, Defect inspection

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithography, Scanners, Inspection, Electroluminescence, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Showing 5 of 13 publications
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