Dr. Byung-Sup Ahn
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 16 October 2017 Paper
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Modulation, Data processing, Photomasks, Computer aided design

Proceedings Article | 3 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Electron beam lithography, Electron beams, Optical lithography, Modulation, Distortion, Image registration, Photomasks, Optical simulations, Neodymium, Vestigial sideband modulation

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Electron beam lithography, Scattering, Metals, Laser scattering, Monte Carlo methods, Ion beams, Ray tracing, Photomasks, Extreme ultraviolet, Molybdenum

Proceedings Article | 20 March 2010 Paper
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Defect detection, Particles, Inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, High volume manufacturing, Semiconducting wafers

Proceedings Article | 20 March 2010 Paper
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Inspection, Atomic force microscopy, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Visibility, Defect inspection

Showing 5 of 13 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top