Dr. Byung-Sup Ahn
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Photomasks, Computer aided design, Data processing, Modulation

Proceedings Article | 3 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Vestigial sideband modulation, Electron beam lithography, Optical simulations, Electron beams, Photomasks, Optical lithography, Distortion, Modulation, Neodymium, Image registration

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Photomasks, Extreme ultraviolet, Scattering, Monte Carlo methods, Ray tracing, Electron beam lithography, Molybdenum, Metals, Ion beams, Laser scattering

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Photomasks, Wafer inspection, Inspection, Particles, Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Defect detection, Mask making, High volume manufacturing

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Defect inspection, Extreme ultraviolet, Critical dimension metrology, Visibility, Ion beams, Atomic force microscopy, Semiconducting wafers

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Lithography, Inspection, Line width roughness, Scanners, Critical dimension metrology, Electroluminescence

Showing 5 of 13 publications
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