Mr. Byungcheol Cha
Principal Engineer
SPIE Involvement:
Conference Program Committee | Author
Publications (23)

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Wafer-level optics, Defect detection, Modulation, Scanners, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Silica, Particles, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Scanning probe microscopy, Vacuum ultraviolet, Ruthenium

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Inspection, Atomic force microscopy, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Visibility, Defect inspection

PROCEEDINGS ARTICLE | May 27, 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Optical spheres, Defect detection, Quartz, Glasses, Particles, Inspection, Atomic force microscopy, Extreme ultraviolet, Surface finishing, Chemical mechanical planarization

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Particles, Manufacturing, Inspection, Surface roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Deposition processes, Defect inspection

PROCEEDINGS ARTICLE | May 29, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Air contamination, Ions, Sulfur, Surface roughness, Chromium, Profiling, Photomasks, Chemical analysis, Molybdenum, Industrial chemicals

Showing 5 of 23 publications
Conference Committee Involvement (2)
Photomask Technology
17 September 2018 | Monterey, California, United States
Photomask Technology
11 September 2017 | Monterey, California, United States
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