Dr. Byunghoon Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Polymers, Molecules, Electrons, Diffusion, Photoresist materials, Finite difference methods, Extreme ultraviolet lithography, Chemical reactions, Line edge roughness

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Semiconductors, Polymers, Molecules, Electrons, Diffusion, Computer simulations, Photoresist materials, Monte Carlo methods, Extreme ultraviolet lithography, Chemical reactions, Line edge roughness, Photochemistry, Photoresist processing, Photoresist developing

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Manufacturing, Inspection, Surface properties, Photomasks, Extreme ultraviolet, Photoresist processing, Semiconducting wafers, Optics manufacturing, Standards development, EUV optics

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