Byungug Cho
at SK Hynix Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Atrial fibrillation, Calibration, Scanners, Manufacturing, Distance measurement, Photomasks, Optical proximity correction, SRAF, Optimization (mathematics)

Proceedings Article | 21 March 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Optical lithography, Data modeling, Calibration, Image processing, Manufacturing, Scanning electron microscopy, Bridges, Optical proximity correction, Semiconducting wafers, Model-based design

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Cadmium, Data modeling, Calibration, Image processing, Scanning electron microscopy, Optical proximity correction, Computer aided design, Tolerancing, Solid modeling, Resolution enhancement technologies

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