C. H. Twu
at United Microelectronics Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 3 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Photomasks, Optical proximity correction

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Lithography, Inspection, 3D modeling, Scanning electron microscopy, Photoresist materials, Near field, Photomasks, Semiconducting wafers

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