C. W. Yeh
at Macronix International Co Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | April 3, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Etching, Image segmentation, Image processing, Coating, Scanning electron microscopy, Scatterometry, Photomasks, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Dielectrics, Photoresist materials, Photomasks, Double patterning technology, Immersion lithography, Semiconducting wafers

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