Dr. Cheming M. Hu
Project Manager at Macronix International Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Calibration, Optical proximity correction, Data modeling, 3D modeling, Scanning electron microscopy, Critical dimension metrology, Photomasks, Feature extraction, Image segmentation, Semiconducting wafers

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Scanning electron microscopy, Image processing, Feature extraction, Critical dimension metrology, Lithography, Semiconducting wafers, Metrology, Image acquisition, Finite element methods, Optical proximity correction

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Optical lithography, Photoresist processing, Calibration, SRAF, Materials processing, Process modeling, Semiconducting wafers, Data modeling, Critical dimension metrology, Remote sensing, Image processing

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Optical proximity correction, Tolerancing, Photomasks, Lithography, Critical dimension metrology, Optical lithography, Detection and tracking algorithms, Error analysis, Calibration, Printing

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Optical proximity correction, Tolerancing, Critical dimension metrology, Lithography, Data modeling, Finite element methods, Metals, Calibration, Photomasks, Inspection

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