Dr. Choongman Lee
at Tokyo Electron Technology Solutions
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 9 April 2018 Paper
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Optical lithography, Etching, Silicon, Inspection, Atomic layer deposition, Photomasks, Line width roughness, Plasma etching, Line edge roughness, Semiconducting wafers

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