Camille Xu
at ChangXin Memory Technologies, Inc.
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 23 March 2020
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Lithography, Photovoltaics, Scanning electron microscopy, Photomasks, Source mask optimization, Optical proximity correction, Nanoimprint lithography, Optimization (mathematics), Semiconducting wafers, Resolution enhancement technologies

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top