Dr. Damien Carau
PhD / Engineer at ESRF - The European Synchrotron
SPIE Involvement:
Author
Area of Expertise:
Optical Metrology , X-Ray Optics , Scatterometry , Semiconductor Physics , Microelectronics , CD & Overlay Metrology
Profile Summary

Engineer in Physics, Electronics and Materials, then PhD in Nanotechnologies, I have a significant background in optics and metrology. Currently working for the European Synchrotron (ESRF) in the X-Ray Optics Group, I am involved in the characterization of multilayer mirrors (thickness and roughness measurements).
Previously, I have been working as a PhD student and a junior engineer at STMicroelectronics for 3 years. I was in charge of the optimization of the scatterometry technique for advanced CMOS node lithography, and more precisely for double patterning lithography. I implemented a specific methodology to gain in sensitivity and accuracy in critical dimension and overlay measurements. I developed a Matlab code to simulate the sensitivity of diffraction-based overlay and scatterometry targets. I have confronted simulation results to experimental data acquired on wafers in clean room environment.
I am interested in acting in ambitious projects combining physics and engineering. Project management would be an extra motivation.
Publications (5)

PROCEEDINGS ARTICLE | August 23, 2017
Proc. SPIE. 10386, Advances in X-Ray/EUV Optics and Components XII
KEYWORDS: Multilayers, Monochromators, Reflectivity, X-ray optics, Sputter deposition, Light sources, Crystals, Coating, X-rays

PROCEEDINGS ARTICLE | August 23, 2017
Proc. SPIE. 10386, Advances in X-Ray/EUV Optics and Components XII
KEYWORDS: Multilayers, X-ray optics, X-rays, Reflectivity, Optical coatings, Reflectometry, Optimization (mathematics), Optical metrology, Optical simulations, Synchrotron radiation

PROCEEDINGS ARTICLE | April 10, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Overlay metrology, Metrology, Etching, Double patterning technology, Critical dimension metrology, Process control, Optical lithography, Diffraction, Image processing, Lithography

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Overlay metrology, Critical dimension metrology, Double patterning technology, Scatterometry, Lithography, Oxides, Etching, Semiconducting wafers, Metrology, Metals

PROCEEDINGS ARTICLE | May 1, 2014
Proc. SPIE. 9132, Optical Micro- and Nanometrology V
KEYWORDS: Double patterning technology, Lithography, Overlay metrology, Scatterometry, Ellipsometry, Oxides, Etching, Scanning electron microscopy, Semiconducting wafers, Reticles

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