Carey M. Thiel
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 16 June 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Lithography, Electron beam lithography, Reticles, Metrology, Silicon, Photomasks, Mask making, Optical alignment, Semiconducting wafers, Projection lithography

Proceedings Article | 16 June 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Oxides, Multilayers, Etching, Dry etching, Silicon, Reflectivity, Chromium, Photomasks, Wet etching, Extreme ultraviolet lithography

Proceedings Article | 28 May 2003
Proc. SPIE. 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Carbon, Lithography, Mechanics, Silicon, Manufacturing, Scanning electron microscopy, Microelectronics, Photomasks, Silicon carbide, Photomicroscopy

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beam lithography, Etching, Silicon, Scanning electron microscopy, Image quality, Photomasks, Boron, Line edge roughness, Semiconducting wafers, Projection lithography

Proceedings Article | 16 August 2002
Proc. SPIE. 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Lithography, Multilayers, Etching, Image processing, X-rays, Inspection, Reflectivity, Chromium, Photomasks, Extreme ultraviolet lithography

Showing 5 of 10 publications
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