Dr. Carl P. Babcock
Senior MTS, OPC Development at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Photovoltaics, Optical lithography, Data modeling, Very large scale integration, Photomasks, Image classification, Optical proximity correction, SRAF, Model-based design, Library classification systems

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Source mask optimization, Optical proximity correction, SRAF, Neodymium, Model-based design, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Etching, Image processing, Electroluminescence, Scanning electron microscopy, Finite element methods, Source mask optimization, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Detection and tracking algorithms, Metals, Printing, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Algorithm development, Resolution enhancement technologies, Fiber optic illuminators

PROCEEDINGS ARTICLE | April 1, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Image processing, Printing, Photomasks, Double patterning technology, Immersion lithography, Optical proximity correction

PROCEEDINGS ARTICLE | March 27, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Mathematical modeling, Statistical analysis, Data modeling, Calibration, Image processing, Computer simulations, Photomasks, Optical proximity correction, Optimization (mathematics), Process modeling

Showing 5 of 10 publications
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