Dr. Carl P. Babcock
Senior MTS, OPC Development at GlobalFoundries
SPIE Involvement:
Publications (10)

Proceedings Article | 18 March 2015 Paper
Proceedings Volume 9426, 942611 (2015) https://doi.org/10.1117/12.2087094
KEYWORDS: Optical proximity correction, Photomasks, SRAF, Photovoltaics, Model-based design, Very large scale integration, Optical lithography, Data modeling, Image classification, Library classification systems

Proceedings Article | 28 March 2014 Paper
Carl Babcock, Dongok Yang, Sarah McGowan, Jun Ye, Bo Yan, Jianhong Qiu, Stanislas Baron, Taksh Pandey, Sanjay Kapasi, Chris Aquino
Proceedings Volume 9053, 90530Z (2014) https://doi.org/10.1117/12.2046662
KEYWORDS: Optical proximity correction, SRAF, Source mask optimization, Optical lithography, Photovoltaics, Neodymium, Lithography, Model-based design, Resolution enhancement technologies

Proceedings Article | 13 March 2012 Paper
DongQing Zhang, GekSoon Chua, YeeMei Foong, Yi Zou, Stephen Hsu, Stanislas Baron, Mu Feng, Hua-Yu Liu, Zhipan Li, Jessy Schramm, T. Yun, Carl Babcock, Byoung IL Choi, Stefan Roling, Alessandra Navarra, Tanja Fischer, Andre Leschok, Xiaofeng Liu, Weijie Shi, Jianhong Qiu, Russell Dover
Proceedings Volume 8326, 83261V (2012) https://doi.org/10.1117/12.916614
KEYWORDS: Source mask optimization, Optical proximity correction, Semiconducting wafers, Lithography, Electroluminescence, Scanning electron microscopy, Finite element methods, Etching, Critical dimension metrology, Image processing

Proceedings Article | 17 October 2008 Paper
Carl Babcock, Yi Zou, Derren Dunn, Zachary Baum, Zengqin Zhao, Itty Matthew, Pat LaCour
Proceedings Volume 7122, 71220R (2008) https://doi.org/10.1117/12.801789
KEYWORDS: SRAF, Optical proximity correction, Resolution enhancement technologies, Photomasks, Critical dimension metrology, Metals, Fiber optic illuminators, Printing, Algorithm development, Detection and tracking algorithms

Proceedings Article | 1 April 2008 Paper
Proceedings Volume 6924, 69243C (2008) https://doi.org/10.1117/12.784107
KEYWORDS: Photomasks, Double patterning technology, Logic, Lithography, Etching, Optical lithography, Optical proximity correction, Immersion lithography, Printing, Image processing

Showing 5 of 10 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top