Dr. Carl P. Babcock
Senior MTS, OPC Development at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Optical proximity correction, Photomasks, SRAF, Photovoltaics, Model-based design, Very large scale integration, Optical lithography, Data modeling, Image classification, Library classification systems

Proceedings Article | 28 March 2014 Paper
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Optical proximity correction, SRAF, Source mask optimization, Optical lithography, Photovoltaics, Neodymium, Lithography, Model-based design, Resolution enhancement technologies

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Source mask optimization, Optical proximity correction, Semiconducting wafers, Lithography, Electroluminescence, Scanning electron microscopy, Finite element methods, Etching, Critical dimension metrology, Image processing

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: SRAF, Optical proximity correction, Resolution enhancement technologies, Photomasks, Critical dimension metrology, Metals, Fiber optic illuminators, Printing, Algorithm development, Detection and tracking algorithms

Proceedings Article | 1 April 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Photomasks, Double patterning technology, Logic, Lithography, Etching, Optical lithography, Optical proximity correction, Immersion lithography, Printing, Image processing

Showing 5 of 10 publications
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