Dr. Carl E. Hess
Director of Engineering at KLA Corp
SPIE Involvement:
Publications (12)

Proceedings Article | 25 October 2016 Paper
Ron Taylor, Jack Downey, Jeffrey Wood, Yen-Hung Lin, Bharathi Bugata, Dongsheng Fan, Carl Hess, Mark Wylie
Proceedings Volume 9985, 99850L (2016) https://doi.org/10.1117/12.2241129
KEYWORDS: Reticles, Inspection, Inspection equipment, Factory automation, Manufacturing, High volume manufacturing, Control systems, Image processing, Semiconducting wafers, Roads

Proceedings Article | 9 September 2013 Paper
Félix Dufaye, Astrid Sippel, Mark Wylie, Edgardo García-Berríos, Charles Crawford, Carl Hess, Luca Sartelli, Carlo Pogliani, Hiroyuki Miyashita, Stuart Gough, Frank Sundermann, Christophe Brochard
Proceedings Volume 8880, 88800N (2013) https://doi.org/10.1117/12.2029470
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Binary data, Logic, Pellicles, Lithography, Metals

Proceedings Article | 8 November 2012 Paper
Proceedings Volume 8522, 85221D (2012) https://doi.org/10.1117/12.968166
KEYWORDS: Semiconducting wafers, Reticles, Photomasks, Inspection, Process control, Critical dimension metrology, Manufacturing, Signal processing, Metrology, Semiconductors

Proceedings Article | 30 September 2009 Paper
Mark Wylie, Trent Hutchinson, Gang Pan, Thomas Vavul, John Miller, Aditya Dayal, Carl Hess, Mike Green, Shad Hedges, Dan Chalom, Maciej Rudzinski, Craig Wood, Jeff McMurran
Proceedings Volume 7488, 74881O (2009) https://doi.org/10.1117/12.830148
KEYWORDS: Photomasks, Reticles, Scanning electron microscopy, Critical dimension metrology, Inspection, Manufacturing, Etching, Error analysis, Semiconducting wafers, Binary data

Proceedings Article | 11 May 2009 Paper
Venu Vellanki, Carl Hess, Gang Pan, Chunlin Chen, Gregg Inderhees, Daniel Lopez
Proceedings Volume 7379, 73791D (2009) https://doi.org/10.1117/12.824319
KEYWORDS: Reticles, Photomasks, Inspection, Critical dimension metrology, Scanning electron microscopy, Scanners, Semiconducting wafers, Manufacturing, Nanoimprint lithography, Feedback control

Showing 5 of 12 publications
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