Dr. Carl E. Hess
Director of Engineering at KLA Corp
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 25 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Reticles, Roads, Image processing, Manufacturing, Inspection, Control systems, Inspection equipment, Factory automation, High volume manufacturing, Semiconducting wafers

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Logic, Metals, Inspection, Scanning electron microscopy, Pellicles, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Semiconductors, Reticles, Metrology, Manufacturing, Inspection, Signal processing, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 30 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Reticles, Etching, Error analysis, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Reticles, Scanners, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Nanoimprint lithography, Critical dimension metrology, Feedback control, Semiconducting wafers

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Reticles, Defect detection, Scanners, Inspection, Image restoration, Printing, Wafer inspection, Photomasks, Semiconducting wafers

Showing 5 of 12 publications
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