Carlo Pogliani
at DNP Photomask Europe SpA
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Reticles, Logic, Inspection, Scanning electron microscopy, Transmission electron microscopy, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers, Phase shifts, Defect inspection

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Logic, Metals, Inspection, Scanning electron microscopy, Pellicles, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Calibration, Error analysis, Manufacturing, Chromium, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Photoresist processing

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