Carlos Fonseca
Manager & Technical Staff Member at Tokyo Electron America, Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (33)

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Diffractive optical elements, Etching, Image processing, Atomic layer deposition, Deposition processes, Critical dimension metrology, Semiconducting wafers, Plasma

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Statistical analysis, Monte Carlo methods, Bridges, Line width roughness, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Overlay metrology

Proceedings Article | 13 March 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Optical lithography, Silica, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Stochastic processes, System on a chip, Plasma treatment

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Metrology, Etching, Error analysis, Extreme ultraviolet, Optical proximity correction, Critical dimension metrology, Photoresist processing, Stochastic processes, Performance modeling

Proceedings Article | 26 April 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Control systems, Computer simulations, Photomasks, Extreme ultraviolet, Semiconducting wafers, TCAD, Back end of line, Front end of line

Proceedings Article | 7 April 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Amorphous silicon, Semiconductors, Lithography, Optical lithography, Silica, Etching, Metals, Coating, Materials processing, Photomasks, Extreme ultraviolet, Double patterning technology, High volume manufacturing, System on a chip, Standards development, Tin

Showing 5 of 33 publications
Conference Committee Involvement (10)
Optical Microlithography XXXIII
23 February 2020 | San Jose, California, United States
Optical Microlithography XXXII
26 February 2019 | San Jose, California, United States
Optical Microlithography XXXI
27 February 2018 | San Jose, California, United States
Optical Microlithography XXX
28 February 2017 | San Jose, California, United States
Optical Microlithography XXIX
23 February 2016 | San Jose, California, United States
Showing 5 of 10 published special sections
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