Mr. Carlton Washburn
Technical Product Manager at Brewer Science Inc
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Etching, Polymers, Oxygen, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, System on a chip

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Polymers, Silicon, Reflectivity, Photoresist materials, Photomasks, Picosecond phenomena, Critical dimension metrology, Semiconducting wafers, Photoresist developing

PROCEEDINGS ARTICLE | March 31, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Lithographic illumination, Polymers, Scanners, Silicon, Diffusion, Photography, Scanning electron microscopy, Photoresist materials, Photoresist developing

PROCEEDINGS ARTICLE | March 31, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Data modeling, Particles, Materials processing, Manufacturing, Intelligence systems, Semiconducting wafers, Product engineering, Process engineering, Liquids

PROCEEDINGS ARTICLE | March 30, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Antireflective coatings, Light sources, Polymers, Silicon, Reflectivity, Electroluminescence, Photoresist materials, Critical dimension metrology, Photoresist developing

PROCEEDINGS ARTICLE | April 11, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Optical lithography, Etching, Copper, Dielectrics, Silicon, Coating, Wet etching, Semiconductor manufacturing, Photoresist processing, Semiconducting wafers

Showing 5 of 9 publications
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