Carlton Washburn
Technical Product Manager at Brewer Science Inc
SPIE Involvement:
Publications (9)

Proceedings Article | 23 March 2012 Paper
Tantiboro Ouattara, Carlton Washburn, Aline Collin, Vandana Krishnamurthy, Douglas Guerrero, Michael Weigand
Proceedings Volume 8322, 83222E (2012)
KEYWORDS: Etching, Extreme ultraviolet lithography, Photoresist materials, Lithography, Extreme ultraviolet, Oxygen, Polymers, System on a chip, Line edge roughness, Scanning electron microscopy

Proceedings Article | 16 April 2011 Paper
Joyce Lowes, Alice Guerrero, Michael Weigand, Carlton Washburn, Charlyn Stroud, Shalini Sharma, David Torres, Mark Slezak, Gary Dabbagh, Cherry Tang
Proceedings Volume 7972, 797227 (2011)
KEYWORDS: Picosecond phenomena, Photoresist materials, Lithography, Semiconducting wafers, Critical dimension metrology, Photoresist developing, Polymers, Silicon, Reflectivity, Photomasks

Proceedings Article | 31 March 2010 Paper
Jim Meador, Alice Guerrero, Joyce Lowes, Charlyn Stroud, Brandy Carr, Anwei Qin, Carlton Washburn, Ramil-Marcelo Mercado
Proceedings Volume 7639, 763926 (2010)
KEYWORDS: Lithography, Photoresist materials, Silicon, Photoresist developing, Diffusion, Polymers, Lithographic illumination, Scanning electron microscopy, Scanners, Photography

Proceedings Article | 31 March 2010 Paper
Brian Smith, Raul Ramirez, Jennifer Braggin, Aiwen Wu, Karl Anderson, John Berron, Nick Brakensiek, Carlton Washburn
Proceedings Volume 7639, 763929 (2010)
KEYWORDS: Semiconducting wafers, Particles, Liquids, Manufacturing, Materials processing, Data modeling, Lithography, Intelligence systems, Product engineering, Process engineering

Proceedings Article | 30 March 2007 Paper
Proceedings Volume 6519, 65192X (2007)
KEYWORDS: Polymers, Lithography, Photoresist developing, Photoresist materials, Electroluminescence, Reflectivity, Antireflective coatings, Critical dimension metrology, Silicon, Light sources

Showing 5 of 9 publications
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