Dr. C. Grant Willson
Rashid Engineering Regent Chair at Univ of Texas at Austin
SPIE Involvement:
Fellow status | Symposium Committee | Symposium Chair | Conference Chair | Author | Instructor
Publications (159)

Proceedings Article | 25 March 2019
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Optical lithography, Silicon

Proceedings Article | 25 March 2019
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Optical lithography, Polymers, Image resolution, Photoresist materials, Photoresist developing, Astatine

Proceedings Article | 25 March 2019
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Lithography, Polymers, Chemistry, Manufacturing, Chromium, Photomasks, Directed self assembly, High volume manufacturing, Nanoimprint lithography, Photoresist processing

Proceedings Article | 22 March 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Etching, Dry etching, Silicon, Chemistry, Scanning electron microscopy, Directed self assembly, Line edge roughness, Reactive ion etching, Semiconducting wafers

Proceedings Article | 19 March 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Optical lithography, Spectroscopy, Silicon, Chromium, Reactive ion etching, Semiconducting wafers, Scanning transmission electron microscopy

Proceedings Article | 19 March 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Thin films, Lithography, Silicon, Chemistry, Silicon films, Polymerization, Photomasks, Directed self assembly, Reactive ion etching, Thin film coatings

Showing 5 of 159 publications
Conference Committee Involvement (14)
SPIE Advanced Lithography
21 February 2016 | San Jose, United States
SPIE Advanced Lithography
23 February 2014 | San Jose, United States
SPIE Advanced Lithography
24 February 2013 | San Jose, United States
SPIE Advanced Lithography
12 February 2012 | San Jose, United States
SPIE Advanced Lithography
27 February 2011 | San Jose, United States
Showing 5 of 14 published special sections
Course Instructor
SC101: Introduction to Microlithography: Theory, Materials, and Processing
The course covers the physics of aerial image generation, the chemistry that is responsible for generation of differential solubility in resists, and the effects of processing variables on the final relief image. While optical exposure is the major focus of this course, electron beam and x-ray exposure are also addressed, as is nanoimprint lithography. The physics section provides an explanation for interference effects and their influence on the aerial image together with a look at aspects of wave front engineering techniques such as phase shift mask design. The chemistry section provides an overview description of the chemical basis for various resist designs, including chemically amplified resists. There will also be a discussion of methods for pitch multiplication such as Self Aligned Double Patterning, DSA, etc. The course also includes a discussion of the influence of material and process variables on the tradeoffs between resolution, line edge roughness and throughput.