Dr. Carmelo Romeo
at Numonyx Agrate
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 2 April 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Lithography, Signal attenuation, Scanners, Process control, Reticles, Scatterometry, Calibration

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Photomasks, Semiconducting wafers, Etching, Manufacturing, Quartz, Optical proximity correction, Airborne remote sensing, Image processing, Phase shifts, Phase shifting

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Photomasks, Lithography, Scanners, Scatterometry, Process control, Signal attenuation, Calibration, 193nm lithography

Proceedings Article | 16 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Semiconducting wafers, Photomasks, Critical dimension metrology, Calibration, Scanners, Signal attenuation, Airborne remote sensing, Reticles, Metrology, Process control

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Photomasks, Semiconducting wafers, Electron beam lithography, Optical lithography, Manufacturing, Etching, Projection lithography, Electron beams, Silicon, Printing

Showing 5 of 9 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top