Dr. Carmelo Romeo
at Numonyx Agrate
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 2 April 2011 Paper
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Signal attenuation, Calibration, Scanners, Scatterometry, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Phase shifting, Etching, Quartz, Image processing, Manufacturing, Photomasks, Optical proximity correction, Semiconducting wafers, Airborne remote sensing, Phase shifts

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Signal attenuation, Calibration, Scanners, Scatterometry, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers, 193nm lithography

Proceedings Article | 16 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Reticles, Metrology, Signal attenuation, Calibration, Scanners, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing

Proceedings Article | 6 May 2005 Paper
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Electron beam lithography, Electron beams, Optical lithography, Etching, Silicon, Manufacturing, Printing, Photomasks, Semiconducting wafers, Projection lithography

Showing 5 of 9 publications
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