Carmen Osorio
at
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Metrology, Etching, Data processing, Process control, Critical dimension metrology, Reactive ion etching, Algorithm development, Data communications, Semiconducting wafers

SPIE Journal Paper | December 19, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Metrology, Transmission electron microscopy, Statistical analysis, Semiconducting wafers, Error analysis, Manufacturing, Scatterometry, Semiconductors, Uncertainty analysis, Quality measurement

SPIE Journal Paper | December 8, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Critical dimension metrology, Metrology, Semiconducting wafers, Scanning electron microscopy, Electron microscopes, Image analysis, Modulation, Diffractive optical elements, Data modeling

SPIE Journal Paper | October 1, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Metrology, Transmission electron microscopy, Semiconducting wafers, Scanning electron microscopy, Electron microscopes, Process control, 3D metrology, Diffractive optical elements, Oxides

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Oxides, Metrology, Diffractive optical elements, Calibration, Scanning electron microscopy, Transmission electron microscopy, 3D metrology, Process control, Semiconducting wafers

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Semiconductors, Metrology, Statistical analysis, Calibration, Error analysis, Transmission electron microscopy, Scatterometry, Measurement devices, Semiconducting wafers, Statistical modeling

Showing 5 of 7 publications
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