Carmen Popescu
at Univ of Birmingham
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Optical lithography, Molecules, Diffusion, Photoresist materials, Extreme ultraviolet lithography, High volume manufacturing, Line edge roughness, Stochastic processes, Chemically amplified resists

PROCEEDINGS ARTICLE | September 19, 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Photoresist materials, Line width roughness, Extreme ultraviolet lithography, Line edge roughness

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Extreme ultraviolet, Epoxies, Extreme ultraviolet lithography, Line edge roughness

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Metals, Molecules, Diffusion, Extreme ultraviolet, Line edge roughness, Stochastic processes, Chemically amplified resists

PROCEEDINGS ARTICLE | September 28, 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beam lithography, Line edge roughness, Chemically amplified resists

Showing 5 of 7 publications
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