Dr. Carola Bläsing Profile

Dr. Carola Bläsing

at Carl Zeiss SMT GmbH

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Author

Publications (11)

Proceedings Article | 9 September 2013 Paper

Fleet matching performance for multiple registration measurement tools

D. Beyer, C. Bläsing, K. Boehm, S. Heisig, D. Seidel

Proceedings Volume 8880, 88801W (2013) https://doi.org/10.1117/12.2026178

KEYWORDS: Calibration, Metrology, Error analysis, Photomasks, Image registration, Overlay metrology, Distance measurement, Manufacturing, 193nm lithography, Optical alignment

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Proceedings Article | 2 April 2011 Paper

The evolution of pattern placement metrology for mask making

Dirk Beyer, Norbert Rosenkranz, Carola Blaesing-Bangert

Proceedings Volume 7985, 79850D (2011) https://doi.org/10.1117/12.896892

KEYWORDS: Photomasks, Metrology, Image registration, Semiconducting wafers, Overlay metrology, Manufacturing, Mask making, Pellicles, Lithography, Double patterning technology

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Proceedings Article | 20 October 2006 Paper

Analysis of the Vistec LMS IPRO3 performance and accuracy enhancement techniques

Gunter Antesberger, Sven Knoth, Frank Laske, Jens Rudolf, Eric Cotte, Benjamin Alles, Carola Bläsing, Wolfgang Fricke, Klaus Rinn

Proceedings Volume 6349, 63491M (2006) https://doi.org/10.1117/12.686089

KEYWORDS: Error analysis, Reticles, Distortion, Calibration, Photomasks, Image registration, Statistical analysis, Ceramics, Statistical methods, Interferometers

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Proceedings Article | 1 August 2002 Paper

Next-generation mask metrology tool

Gerhard Schlueter, Klaus-Dieter Roeth, Carola Blaesing-Bangert, Michael Ferber

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476920

KEYWORDS: Photomasks, Critical dimension metrology, Metrology, Optical testing, Image registration, Semiconducting wafers, Lithography, Mirrors, Objectives, Resolution enhancement technologies

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Proceedings Article | 5 September 2001 Paper

First performance data obtained on next-generation optical mask metrology tools

Klaus-Dieter Roeth, Carola Blaesing-Bangert, Herger Alt, Gerhard Schlueter

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438331

KEYWORDS: Deep ultraviolet, Metrology, Critical dimension metrology, Photomasks, Edge detection, Imaging systems, Lithographic illumination, Optical resolution, Ultraviolet radiation, Environmental sensing

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Proceedings Article | 27 December 1996 Paper

Performance data obtained on a new mask metrology tool

Klaus-Dieter Roeth, Carola Blaesing-Bangert, John Whittey

Proceedings Volume 2884, (1996) https://doi.org/10.1117/12.262819

KEYWORDS: Metrology, Photomasks, Overlay metrology, Edge detection, Semiconducting wafers, Laser systems engineering, CCD cameras, Image analysis, Reticles, Interferometers

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Proceedings Article | 21 May 1996 Paper

Performance data obtained on a next-generation mask metrology tool

Klaus-Dieter Roeth, Carola Blaesing-Bangert

Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240127

KEYWORDS: Metrology, Photomasks, Edge detection, Time metrology, Overlay metrology, Laser systems engineering, Critical dimension metrology, Semiconducting wafers, Data centers, Interferometers

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Proceedings Article | 3 July 1995 Paper

Ultrahigh-precision metrology on masks for 0.25 um device generation

Klaus-Dieter Roth, Carola Blaesing-Bangert

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212762

KEYWORDS: Metrology, Photomasks, Reticles, Time metrology, Phase shifts, Semiconducting wafers, Critical dimension metrology, Overlay metrology, Lithography, Mask making

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Proceedings Article | 3 November 1994 Paper

Using the Leitz LMS 2000 for monitoring and improvement of an e-beam

Carola Blaesing-Bangert, Klaus-Dieter Roeth, Yoichi Ogawa

Proceedings Volume 2254, (1994) https://doi.org/10.1117/12.191948

KEYWORDS: Metrology, Photomasks, X-ray technology, Process control, Tolerancing, X-rays, Critical dimension metrology, Overlay metrology, Semiconductors, Lithography

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Proceedings Article | 1 June 1992 Paper

Metrology on phase-shift masks

Klaus-Dieter Roeth, Wilhelm Maurer, Carola Blaesing-Bangert

Proceedings Volume 1673, (1992) https://doi.org/10.1117/12.59794

KEYWORDS: Photomasks, Phase shifts, Metrology, Chromium, Critical dimension metrology, Manufacturing, Lithography, Tolerancing, Integrated circuits, Inspection

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Proceedings Article | 1 June 1990 Paper

Increasing the dimensions of metrology

Wilhelm Maurer, Carola Blaesing-Bangert, Hans-Helmut Paul

Proceedings Volume 1261, (1990) https://doi.org/10.1117/12.20071

KEYWORDS: Photomasks, Metrology, Overlay metrology, Process control, Semiconducting wafers, Integrated circuits, Inspection, Error analysis, Lithography, Calibration

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Showing 5 of 11 publications

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