Caroline C. Boulenger
Sr Process Engineer at X-FAB France SAS
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Satellites, Inspection, Scanning electron microscopy, Photoresist materials, Photomasks, Photoresist processing, Semiconducting wafers, Standards development, 193nm lithography

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