Carolien Boeckx
at IMEC
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Metrology, Data modeling, Image processing, Image analysis, Scanning electron microscopy, Process control, Software development, Algorithm development, Data analysis

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Metrology, Logic, Optical lithography, Etching, Scanners, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Directed self assembly, Extreme ultraviolet lithography, Immersion lithography, Stochastic processes, Personal protective equipment

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