Carsten Kohler
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Chromatic aberrations, Lithography, Metrology, Optical lithography, Laser drilling, Electroluminescence, Photomasks, Immersion lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Atrial fibrillation, Data modeling, Calibration, Scanners, 3D modeling, Scanning electron microscopy, Photomasks, Aluminum, Optical proximity correction, Photoresist processing

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Reticles, Lithographic illumination, Polarization, Imaging systems, Electroluminescence, Photomasks, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 28 May 2003
Proc. SPIE. 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Lithography, Reticles, Computer simulations, Scanning electron microscopy, Photomasks, Shape analysis, Critical dimension metrology, Semiconducting wafers, Americium, Phase shifts

Proceedings Article | 30 July 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Image processing, Electroluminescence, Printing, Image filtering, Photomasks, Nanoimprint lithography, Binary data

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