Catherine A. Baker
MaskCAD Manager at
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | September 1, 1998
Proc. SPIE. 3412, Photomask and X-Ray Mask Technology V
KEYWORDS: Lithography, Diffraction, Reticles, Etching, Quartz, Photomasks, Optical proximity correction, Phase measurement, Anisotropic etching, Phase shifts

PROCEEDINGS ARTICLE | February 15, 1994
Proc. SPIE. 2087, 13th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Reticles, Safety, Etching, Chemistry, Control systems, Robots, Process control, Critical dimension metrology, Optics manufacturing, Photomask technology

PROCEEDINGS ARTICLE | March 26, 1993
Proc. SPIE. 1809, 12th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Electron beams, Reticles, Opacity, Particles, Composites, Photoresist materials, Photomasks, Tolerancing, Edge roughness, Data analysis

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