Catherine A. Baker
MaskCAD Manager
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 1 September 1998 Paper
Proc. SPIE. 3412, Photomask and X-Ray Mask Technology V
KEYWORDS: Lithography, Diffraction, Reticles, Etching, Quartz, Photomasks, Optical proximity correction, Phase measurement, Anisotropic etching, Phase shifts

Proceedings Article | 15 February 1994 Paper
Proc. SPIE. 2087, 13th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Reticles, Safety, Etching, Chemistry, Control systems, Robots, Process control, Critical dimension metrology, Optics manufacturing, Photomask technology

Proceedings Article | 26 March 1993 Paper
Proc. SPIE. 1809, 12th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Electron beams, Reticles, Opacity, Particles, Composites, Photoresist materials, Photomasks, Tolerancing, Edge roughness, Data analysis

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