Dr. Cecily E. Andes
at Dow Electronic Materials
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 20, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Polymers, Chemistry, Printing, Photoresist materials, Photomasks, Line width roughness, Critical dimension metrology, Semiconducting wafers, Photoresist developing

PROCEEDINGS ARTICLE | March 19, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Polymers, Molecules, Photoresist materials, Molecular interactions, Photoresist processing, Semiconducting wafers, Radium, Photoresist developing, Polymer thin films

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Optical lithography, Etching, Polymers, Photoresist materials, Photomasks, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers, Systems modeling, Photoresist developing

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Etching, Diffusion, 3D modeling, Atomic force microscopy, Scanning electron microscopy, Photoresist materials, Line width roughness, Critical dimension metrology, Line edge roughness

PROCEEDINGS ARTICLE | March 22, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Data modeling, Etching, Chemical species, Polymers, Error analysis, Resistance, Photoresist materials, Statistical modeling, Photoresist developing

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