Cecily E. Andes
Global Account Manager at DuPont Electronics & Industrial
SPIE Involvement:
Publications (5)

Proceedings Article | 20 March 2012 Paper
Michael Reilly, Cecily Andes, Thomas Cardolaccia, Young Seok Kim, Jong Keun Park
Proceedings Volume 8325, 832507 (2012) https://doi.org/10.1117/12.916633
KEYWORDS: Photoresist developing, Photoresist materials, Chemistry, Lithography, Photomasks, Line width roughness, Polymers, Printing, Semiconducting wafers, Critical dimension metrology

Proceedings Article | 19 March 2012 Paper
Seung-Hyun Lee, Jong Keun Park, Thomas Cardolaccia, Jibin Sun, Cecily Andes, Kathleen O'Connell, George Barclay
Proceedings Volume 8325, 83250Q (2012) https://doi.org/10.1117/12.918045
KEYWORDS: Polymers, Photoresist developing, Photoresist materials, Lithography, Semiconducting wafers, Molecules, Photoresist processing, Molecular interactions, Polymer thin films, Radium

Proceedings Article | 16 April 2011 Paper
Proceedings Volume 7972, 797206 (2011) https://doi.org/10.1117/12.882843
KEYWORDS: Photoresist developing, Photoresist materials, Polymers, Systems modeling, Semiconducting wafers, Optical lithography, Optical proximity correction, Photomasks, Etching, Nanoimprint lithography

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 65181Q (2007) https://doi.org/10.1117/12.712186
KEYWORDS: Line edge roughness, Atomic force microscopy, Line width roughness, Scanning electron microscopy, Critical dimension metrology, Diffusion, Photoresist materials, Lithography, 3D modeling, Etching

Proceedings Article | 22 March 2007 Paper
Damien Perret, Cecily Andes, Kap-Soo Cheon, Mani Sobhian, Charles Szmanda, George Barclay, Peter Trefonas
Proceedings Volume 6519, 651912 (2007) https://doi.org/10.1117/12.712242
KEYWORDS: Etching, Polymers, Photoresist materials, Resistance, Chemical species, Lithography, Error analysis, Photoresist developing, Data modeling, Statistical modeling

  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top