Celine Berger
at Infineon Technologies AG
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Reticles, Deep ultraviolet, Image processing, Ions, Photoresist materials, Photomasks, Optical proximity correction, Semiconducting wafers, Laser sintering

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Metrology, Coating, Process control, Absorbance, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Phase shifts, Chemical mechanical planarization

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Reticles, Etching, Manufacturing, Chromium, Control systems, Photomasks, Forward error correction, Photoresist processing, Semiconducting wafers, Standards development

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