Dr. Céline Lapeyre
Research Engineer at Commissariat à l'Energie Atomique
SPIE Involvement:
Publications (23)

Proceedings Article | 27 April 2023 Poster + Paper
Proceedings Volume 12496, 124962C (2023) https://doi.org/10.1117/12.2657422
KEYWORDS: Wafer bonding, Semiconducting wafers, Scanners, Silicon, Distortion, Optical alignment, Transistors, Oxides, Crystals, Etching

Proceedings Article | 27 April 2023 Poster + Paper
Proceedings Volume 12496, 1249633 (2023) https://doi.org/10.1117/12.2658296
KEYWORDS: Annealing, Semiconducting wafers, Metrology, Distortion, Overlay metrology, Deformation, Chemical mechanical planarization, Silicon, Optical interferometry, Manufacturing

Proceedings Article | 20 March 2020 Paper
Proceedings Volume 11325, 113251L (2020) https://doi.org/10.1117/12.2552012
KEYWORDS: Overlay metrology, Metrology, Scanners, Critical dimension metrology

Proceedings Article | 19 March 2018 Presentation
Ahmed Gharbi, Florian DELACHAT, Patricia Pimenta-Barros, Gaëlle Chamiot-Maitral, Maxime Argoud, Celine Lapeyre, Laurent Pain, Christophe Navarro, Célia Nicolet, Ian Cayrefourcq, Raluca Tiron
Proceedings Volume 10584, 105840D (2018) https://doi.org/10.1117/12.2297422
KEYWORDS: Directed self assembly, Optical lithography, Critical dimension metrology, Silicon, Oxides, Semiconducting wafers, Semiconductors, Materials processing, Photomasks, Photoresist processing

Proceedings Article | 10 April 2017 Presentation + Paper
S. Landis, H. Teyssedre, G. Claveau, I. Servin, F. Delachat, M. L. Pourteau, A. Gharbi, P. Pimenta Barros, R. Tiron, L. Nouri, N. Possemé, M. May, P. Brianceau, S. Barnola, Y. Blancquaert, J. Pradelles, P. Essomba, A. Bernadac, B. Dal'zotto, S. Bos, M. Argoud, G. Chamiot-Maitral, A. Sarrazin, C. Tallaron, C. Lapeyre, L. Pain
Proceedings Volume 10149, 101490K (2017) https://doi.org/10.1117/12.2259966
KEYWORDS: Directed self assembly, Lithography, Line width roughness, Nanoimprint lithography, Semiconducting wafers, Etching, Electron beam lithography, System on a chip, Critical dimension metrology, Photoresist processing

Showing 5 of 23 publications
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