Dr. Cesar M. Garza
Photo Dev Manager at Freescale Semiconductor Inc
SPIE Involvement:
Publications (24)

Proceedings Article | 16 November 2007 Paper
Proceedings Volume 6730, 67302R (2007) https://doi.org/10.1117/12.740717
KEYWORDS: Semiconducting wafers, Photomasks, Lithography, Manufacturing, Image transmission, Image processing, Optical lithography, Semiconductors, Quartz, Wafer manufacturing

Proceedings Article | 2 April 2007 Paper
Proceedings Volume 6520, 65201L (2007) https://doi.org/10.1117/12.714341
KEYWORDS: Polarization, Refractive index, Photoresist materials, Water, Imaging devices, Lithography, Photomasks, Semiconductors, Photoresist developing, Manufacturing

Proceedings Article | 29 March 2006 Paper
Richard Peters, Cesar Garza, Terry Breeden, Marijean Azrak, Kiwoon Kim, Jack Jiang, Patrick Montgomery
Proceedings Volume 6153, 61532Y (2006) https://doi.org/10.1117/12.651047
KEYWORDS: Photoresist materials, Ions, Fluorine, Boron, Ion implantation, Semiconducting wafers, Silicon, Phosphorus, Chemical species, Semiconductors

Proceedings Article | 14 March 2006 Paper
Bill Wilkinson, Al Reich, Jim Wiley, Brian Troy, Youval Nehmadi, Moshe Poyastro, Joyce Zhao, Jim Vasek, Cesar Garza, Zamir Abraham
Proceedings Volume 6156, 61561B (2006) https://doi.org/10.1117/12.656856
KEYWORDS: Lithography, Optical proximity correction, Scanning electron microscopy, Manufacturing, Semiconducting wafers, Electroluminescence, Critical dimension metrology, Control systems, Process control, Resolution enhancement technologies

Proceedings Article | 4 May 2005 Paper
Cesar Garza, Dan Babbitt, Richard Peters, Stanley Filipiak, Patrick Montgomery, Tab Stephens
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599918
KEYWORDS: Photoresist processing, Cadmium sulfide, Fluorine, Optical lithography, Thermal effects, Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, Polymers, Semiconductors

Showing 5 of 24 publications
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