Dr. Cesar M. Garza
Photo Dev Manager at Freescale Semiconductor Inc
SPIE Involvement:
Publications (24)

Proceedings Article | 16 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Semiconductors, Lithography, Optical lithography, Quartz, Image processing, Manufacturing, Image transmission, Photomasks, Semiconducting wafers, Wafer manufacturing

Proceedings Article | 2 April 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Semiconductors, Lithography, Refractive index, Polarization, Water, Manufacturing, Imaging devices, Photoresist materials, Photomasks, Photoresist developing

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Semiconductors, Chemical species, Ions, Silicon, Photoresist materials, Ion implantation, Boron, Phosphorus, Fluorine, Semiconducting wafers

Proceedings Article | 14 March 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Lithography, Manufacturing, Control systems, Electroluminescence, Scanning electron microscopy, Process control, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Semiconductors, Optical lithography, Polymers, Scanning electron microscopy, Thermal effects, Cadmium sulfide, Critical dimension metrology, Fluorine, Photoresist processing, Semiconducting wafers

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Atrial fibrillation, Chemical species, Polymers, Hydrogen, Infrared spectroscopy, Pellicles, Photomasks, Fluorine, Ferroelectric polymers

Showing 5 of 24 publications
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