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Chad Brubaker
Process Engineer at EV Group Inc
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Publications (2)
Proceedings Article | 16 June 2003 Paper
Thick resist alignment technology for MEMS and advanced packaging
Chad Brubaker, Bernhard Wieder, Paul Lindner
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484736
KEYWORDS: Optical alignment, Photomasks, Semiconducting wafers, Microelectromechanical systems, Packaging, Microscopes, Optical lithography, Photoresist materials, Image quality standards, Lithography
Proceedings Article | 24 July 2002 Paper
Ultra-thick lithography for advanced packaging and MEMS
Chad Brubaker, Rafiqul Islam, Helge Luesebrink
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474225
KEYWORDS: Microelectromechanical systems, Packaging, Semiconducting wafers, Coating, Photomasks, Photoresist materials, Thin film coatings, Etching, Manufacturing, Lithography
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