Chain-Ting Huang
at United Microelectronics Corp
SPIE Involvement:
Publications (6)

Proceedings Article | 26 September 2019 Paper
Proceedings Volume 11148, 111481H (2019)
KEYWORDS: Lithography, Photomasks, Process modeling, Optical proximity correction, Semiconducting wafers, Machine learning, Resolution enhancement technologies, Source mask optimization, Critical dimension metrology, Computer simulations

Proceedings Article | 27 June 2019 Paper
Proceedings Volume 11178, 111780Q (2019)
KEYWORDS: Photomasks, Optical proximity correction, Scanning electron microscopy, Optical calibration, Critical dimension metrology, Optical simulations, Bridges, Etching, Calibration, Wafer-level optics

Proceedings Article | 23 October 2015 Paper
William Chou, James Cheng, Alex Tseng, J. Wu, Chin Kuei Chang, Jeffrey Cheng, Adder Lee, Chain Ting Huang, N. Peng, Simon C. Hsu, Chun Chi Yu, Colbert Lu, Julia Yu, Peter Craig, Chuck Pollock, Young Ham, Jeff McMurran
Proceedings Volume 9635, 96351R (2015)
KEYWORDS: Photomasks, Semiconducting wafers, Overlay metrology, Image registration, Double patterning technology, Lithography, Source mask optimization, Reticles, Pellicles, 193nm lithography

Proceedings Article | 31 March 2014 Paper
Proceedings Volume 9052, 90522A (2014)
KEYWORDS: Photomasks, Semiconducting wafers, Bridges, Optical proximity correction, Metals, Printing, Scattering, Error analysis, Double patterning technology, Photoresist materials

Proceedings Article | 30 June 2012 Paper
Chain Ting Huang, Cloud Cheng, Ming Jui Chen
Proceedings Volume 8441, 84410V (2012)
KEYWORDS: Line width roughness, Photomasks, Semiconducting wafers, Extreme ultraviolet, Printing, 3D modeling, Wafer-level optics, Line edge roughness, Scanning electron microscopy, Critical dimension metrology

Showing 5 of 6 publications
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