Chain-Ting Huang
at United Microelectronics Corp
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Reticles, Image registration, Pellicles, Photomasks, Double patterning technology, Source mask optimization, Semiconducting wafers, Overlay metrology, 193nm lithography

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Scattering, Metals, Error analysis, Printing, Photoresist materials, Bridges, Photomasks, Double patterning technology, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | June 30, 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Wafer-level optics, 3D modeling, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Line width roughness, Critical dimension metrology, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Reticles, Contamination, Calibration, Image processing, Manufacturing, Inspection, Reflectivity, Photomasks, Semiconducting wafers

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