Chain-Ting Huang
at United Microelectronics Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Photomasks, Process modeling, Optical proximity correction, Semiconducting wafers, Machine learning, Resolution enhancement technologies, Source mask optimization, Critical dimension metrology, Computer simulations

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Photomasks, Optical proximity correction, Scanning electron microscopy, Optical calibration, Critical dimension metrology, Optical simulations, Bridges, Etching, Calibration, Wafer-level optics

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Photomasks, Semiconducting wafers, Overlay metrology, Image registration, Double patterning technology, Lithography, Source mask optimization, Reticles, Pellicles, 193nm lithography

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Photomasks, Semiconducting wafers, Bridges, Optical proximity correction, Metals, Printing, Scattering, Error analysis, Double patterning technology, Photoresist materials

Proceedings Article | 30 June 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Line width roughness, Photomasks, Semiconducting wafers, Extreme ultraviolet, Printing, 3D modeling, Wafer-level optics, Line edge roughness, Scanning electron microscopy, Critical dimension metrology

Showing 5 of 6 publications
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