Chami Perera
VP Operations at EUV Tech
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 7 November 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Metrology, Scanners, Inspection, Pellicles, Reflectometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing

SPIE Journal Paper | 12 September 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Metrology, Line width roughness, Scanning electron microscopy, Digital filtering, Atomic force microscopy, Standards development, Semiconductors, Image acquisition, Image quality, Electron microscopes

Proceedings Article | 4 September 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Sensors, Particles, Reflectivity, Pellicles, Reflectometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

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