Dr. Chan-Ha Park
Senior Technical Staff at SK Hynix Inc
SPIE Involvement:
Author
Publications (33)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: SRAF, Lithography, Optical proximity correction, Optical lithography

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Optical proximity correction, Lithography, SRAF, Semiconducting wafers, Photomasks, Manufacturing, Computer simulations

PROCEEDINGS ARTICLE | April 4, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Optical proximity correction, Optical lithography, Manufacturing, Photomasks, Semiconducting wafers, Atrial fibrillation, Source mask optimization, Image processing

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Optical proximity correction, Photomasks, Manufacturing, Atrial fibrillation, Optical lithography, Model-based design, Lithography, Defect detection, Source mask optimization, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Overlay metrology, Metrology, Optical testing, Defect inspection, Inspection, Defect detection, Control systems, Semiconductors, Databases, Distortion, Chemical mechanical planarization, Etching

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Overlay metrology, Optical proximity correction, Diffraction, Critical dimension metrology, Metrology, Scanning electron microscopy, Electron microscopes, Optical lithography, Error analysis, Target detection

Showing 5 of 33 publications
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