Dr. Chan-Ha Park
Senior Technical Staff at SK Hynix Inc
SPIE Involvement:
Author
Publications (41)

Proceedings Article | 23 March 2020
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Lithography, Deep ultraviolet, Sensors, Scanners, Optical alignment, Optimization (mathematics), Feedback control, Semiconducting wafers, Overlay metrology

Proceedings Article | 20 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Wafer-level optics, Near infrared, Optical filters, Metrology, Optical parametric oscillators, Photoresist materials, 3D metrology, Semiconducting wafers, Overlay metrology, Imaging metrology

Proceedings Article | 20 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Lithography, Metrology, Scanners, Immersion lithography, Critical dimension metrology, Semiconducting wafers, Lithographic process control

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Optical lithography, Etching, Image processing, Image analysis, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Failure analysis

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Wafer-level optics, Metrology, Diffractive optical elements, Imaging systems, Manufacturing, Quality measurement, Scanning electron microscopy, Scatterometry, Semiconducting wafers, Overlay metrology

Showing 5 of 41 publications
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