Chan-Ho Ryu
at ASML Korea Co Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 3 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Optical lithography, Etching, Control systems, Scatterometry, Process control, Double patterning technology, Deposition processes, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Diffraction, Metrology, Data modeling, Inspection, Computer simulations, Printing, Semiconducting wafers, Overlay metrology, Diffraction gratings

Proceedings Article | 20 April 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Diffraction, Metrology, Optical lithography, Scanning electron microscopy, Double patterning technology, Semiconducting wafers, Overlay metrology, Resolution enhancement technologies, Diffraction gratings

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Oxides, Lithography, Diffraction, Metrology, Image processing, Scatterometry, Photoresist processing, Semiconducting wafers, Overlay metrology, Diffraction gratings

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top