Mr. Chan Sik Park
at Dongbu HiTek Co Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Silicon, Photomasks, Double patterning technology, Photoresist processing, Thermal oxidation, Oxidation

PROCEEDINGS ARTICLE | March 23, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Semiconductors, Lithography, Polymers, Silicon, Manufacturing, Photoresist materials, Immersion lithography, Fluorine, Semiconducting wafers, Polymer thin films

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Semiconductors, Lithography, Monochromatic aberrations, Polymers, Molecules, Diffusion, Photoresist materials, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Optical lithography, Electrodes, Polymers, Diffusion, Resistance, Photoresist materials, Optical proximity correction, Semiconducting wafers, Quenching (fluorescence)

PROCEEDINGS ARTICLE | June 25, 2004
Proc. SPIE. 5363, Emerging Optoelectronic Applications
KEYWORDS: Optical fibers, Optical components, Polishing, Single mode fibers, Wave propagation, Fiber couplers, Optical networks, Beam propagation method, Standards development, Novel fiber development

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top