Mr. Chan Sik Park Profile

Chan Sik Park

at Dongbu HiTek Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 7 March 2008 Paper

Double patterning in lithography for 65nm node with oxidation process

Eunsoo Jeong, Jeahee Kim, Kwangsun Choi, Minkon Lee, Doosung Lee, Myungsoo Kim, Chansik Park

Proceedings Volume 6924, 692424 (2008) https://doi.org/10.1117/12.772544

KEYWORDS: Silicon, Oxides, Double patterning technology, Etching, Optical lithography, Photomasks, Lithography, Photoresist processing, Thermal oxidation, Oxidation

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Proceedings Article | 23 March 2007 Paper

Polymer structure modifications for immersion leaching control

Sang Hyang Lee, Jung Woo Kim, Jeong Woo Kim, Seung Keun Oh, Chan Sik Park, Jung Youl Lee, Sang Soo Kim, Jae Woo Lee, Deogbae Kim, Jaehyun Kim, Keun Do Ban, Cheol Kyu Bok, Seung Chan Moon

Proceedings Volume 6519, 651925 (2007) https://doi.org/10.1117/12.711889

KEYWORDS: Polymers, Semiconducting wafers, Fluorine, Immersion lithography, Semiconductors, Polymer thin films, Photoresist materials, Lithography, Manufacturing, Silicon

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Proceedings Article | 29 March 2006 Paper

Parameter investigation of PEB sensitivity

Seung Keun Oh, Eun Kyung Son, Chan Sik Park, Jung Youl Lee, Jeong Woo Kim, Jae Woo Lee, Deog Bae Kim, Jaehyun Kim, Geunsu Lee, Seung-Chan Moon

Proceedings Volume 6153, 615335 (2006) https://doi.org/10.1117/12.655449

KEYWORDS: Polymers, Diffusion, Critical dimension metrology, Molecules, Photoresist processing, Monochromatic aberrations, Semiconducting wafers, Semiconductors, Lithography, Photoresist materials

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Proceedings Article | 4 May 2005 Paper

Diffusion contributions to line end shortening in 193-nm photolithography

Eun-Kyung Son, Jung-Woo Kim, Sang-Hyang Lee, Chan-Sik Park, Jae-Woo Lee, Jaehyun Kim, Geun-Su Lee, Sung-Koo Lee, Keun-Do Ban, Jae-Chang Jung, Cheol Kyu Bok, Seung-Chan Moon

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598615

KEYWORDS: Diffusion, Polymers, Photoresist materials, Optical lithography, Electrodes, Lithography, Semiconducting wafers, Resistance, Optical proximity correction, Quenching (fluorescence)

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Proceedings Article | 25 June 2004 Paper

A development of a novel TEC lensed fiber with working distance of 60µm using a standard single mode fiber

Byoung-Chan Choi, Jun-Ho Park, Sang-Man Lee, Chan-Sik Park, Man-Seop Lee

Proceedings Volume 5363, (2004) https://doi.org/10.1117/12.528770

KEYWORDS: Single mode fibers, Standards development, Novel fiber development, Polishing, Fiber couplers, Wave propagation, Beam propagation method, Optical networks, Optical fibers, Optical components

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