Mr. Chan-Tsun Wu Profile

Chan-Tsun Wu

Technical Deputy Manager at Powerchip Semiconductor Corp

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Publications (4)

Proceedings Article | 16 April 2011 Paper

Process capability of implementing ArF negative resist into production

Meng-Feng Tsai, Yang-Liang Li, Chan-Tsun Wu, Yi-Shiang Chang, Chia-Chi Lin

Proceedings Volume 7972, 79721B (2011) https://doi.org/10.1117/12.879316

KEYWORDS: Photomasks, Photoresist processing, Double patterning technology, Semiconducting wafers, Lithography, Printing, Etching, Critical dimension metrology, Line width roughness, Optical alignment

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Proceedings Article | 4 March 2010 Paper

Examining reflectivity criterion for various ArF lithography

Meng-Feng Tsai, Chia-Chi Lin, Wei-Chun Chao, Chan-Tsun Wu, Jun-Cheng Lai

Proceedings Volume 7640, 76403H (2010) https://doi.org/10.1117/12.848324

KEYWORDS: Reflectivity, Reflection, Lithography, Resolution enhancement technologies, Optical proximity correction, Bottom antireflective coatings, Photoresist processing, Carbon, Lithographic illumination, Double patterning technology

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Proceedings Article | 11 April 2008 Paper

The rapid introduction of immersion lithography for NAND flash: challenges and experience

Chan-Tsun Wu, Hung Ming Lin, Wei-Ming Wu, Meng-Hsun Chan, Benjamin Lin, Kuan-Heng Lin, Andrew Hazelton, Toshio Ohhashi, Katsushi Nakano, Yasuhiro Iriuchijima, Chunhsin Lee, Long Hung

Proceedings Volume 6924, 69241A (2008) https://doi.org/10.1117/12.772448

KEYWORDS: Photoresist materials, Semiconducting wafers, Particles, Scanners, Line width roughness, Immersion lithography, Lithography, Critical dimension metrology, Coating, Defect inspection

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Proceedings Article | 24 March 2008 Paper

Improve overlay control and scanner utilization through high order corrections

Hung Ming Lin, Benjamin Lin, James Wu, Smixer Chiu, Chin-Chou Kevin Huang, James Manka, Desmond Goh, Healthy Huang, David Tien

Proceedings Volume 6922, 69222R (2008) https://doi.org/10.1117/12.772118

KEYWORDS: Semiconducting wafers, Scanners, Overlay metrology, Control systems, Manufacturing, Metrology, Data modeling, Process control, Semiconductors, Optical alignment

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