Chan-Tsun Wu
Technical Deputy Manager at Powerchip Semiconductor Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 16 April 2011 Paper
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Etching, Printing, Photomasks, Line width roughness, Double patterning technology, Optical alignment, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Carbon, Lithography, Lithographic illumination, Reflection, Reflectivity, Double patterning technology, Optical proximity correction, Photoresist processing, Resolution enhancement technologies, Bottom antireflective coatings

Proceedings Article | 11 April 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Scanners, Particles, Coating, Photoresist materials, Line width roughness, Immersion lithography, Critical dimension metrology, Semiconducting wafers, Defect inspection

Proceedings Article | 24 March 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Semiconductors, Metrology, Data modeling, Scanners, Manufacturing, Control systems, Process control, Optical alignment, Semiconducting wafers, Overlay metrology

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