Dr. Chan Hwang
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (31)

Proceedings Article | 10 April 2024 Open Access Presentation
Proceedings Volume PC12953, PC1295303 (2024) https://doi.org/10.1117/12.3027044

Proceedings Article | 10 April 2024 Paper
Proceedings Volume 12953, 1295309 (2024) https://doi.org/10.1117/12.3010718
KEYWORDS: Extreme ultraviolet, Mirrors, Light sources and illumination, Semiconducting wafers, Simulations, Nanoimprint lithography, Metrology, Critical dimension metrology, Source mask optimization, Phase shifts

Proceedings Article | 10 April 2024 Poster + Paper
Proceedings Volume 12955, 129553P (2024) https://doi.org/10.1117/12.3012950
KEYWORDS: Overlay metrology, Signal to noise ratio, Denoising, Semiconducting wafers, Metrology, Inspection, Phase shifts, Optical gratings, Industrial applications, Diffraction

Proceedings Article | 27 April 2023 Presentation + Paper
Proceedings Volume 12496, 124960N (2023) https://doi.org/10.1117/12.2658274
KEYWORDS: Scanners, Overlay metrology, Semiconducting wafers, Lithography, Metrology, Dysprosium, Distributed interactive simulations, Design and modelling, Critical dimension metrology, Yield improvement

Proceedings Article | 27 April 2023 Presentation + Paper
Jungmin Lee, Doogyu Lee, Eunji Lee, Inbeom Yim, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Marc Noot, Arno van Leest, Simon Mathijssen, Yao Gao, Seung-Bin Yang, Mi-Yeon Baek, Do-Haeng Lee, Han-Gyeol Park, Jong-Hyuk Yim, Thomas Kim, Ho-Hyuk Lee, Kemal Dahha, Stefan Smith-Meerman, Koen van Witteveen, Elliott McNamara, Matthew McLaren
Proceedings Volume 12496, 124960H (2023) https://doi.org/10.1117/12.2658330
KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Matrices, Polarization, Wafer testing, Signal processing, Independent component analysis, Education and training, Diffraction

Showing 5 of 31 publications
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