Dr. Chan Hwang Profile

Dr. Chan Hwang

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (31)

Proceedings Article | 10 April 2024 Open Access

Lithography technology for memory device patterning

Chan Hwang

Proceedings Volume PC12953, PC1295303 (2024) https://doi.org/10.1117/12.3027044

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Proceedings Article | 10 April 2024 Paper

EUV source pole control for LCDU and CD ellipticity handling in hexagonal contact arrays

Jieun Song, Janghun Kim, Hyung Jong Bae, Sudeok Kim, Soonmok Ha, Woojin Jung, Seokwon Cho, Jeounghun Park, Dohyeon Park, Eunji Lee, Minseung Song, Hyunseung Ha, Keesun Han, Young Joo Choi, Gyeongseok Park, Seongbo Shim, Chan Hwang

Proceedings Volume 12953, 1295309 (2024) https://doi.org/10.1117/12.3010718

KEYWORDS: Extreme ultraviolet, Mirrors, Light sources and illumination, Semiconducting wafers, Simulations, Nanoimprint lithography, Metrology, Critical dimension metrology, Source mask optimization, Phase shifts

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Proceedings Article | 10 April 2024 Poster + Paper

Multi-wavelength continuous-bias DBO metrology for improved ADI process-robustness

Jungmin Lee, Inbeom Yim, Byeong Seon Park, Changyeon Lee, Mincheol Kwak, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Jay Mummery, Bruno Gregorio Almeida, Han-Gyeol Park, Mi-Yeon Baek, Kemal Dahha, Ki-Youn Lee, Se-Hui Lee, Arno van Leest, Thao Nguyen, Marc Noot, Stefan Smith-Meerman, Koen van Witteveen, Jong-Hyuk Yim, Olger Zwier

Proceedings Volume 12955, 129553P (2024) https://doi.org/10.1117/12.3012950

KEYWORDS: Overlay metrology, Signal to noise ratio, Denoising, Semiconducting wafers, Metrology, Inspection, Phase shifts, Optical gratings, Industrial applications, Diffraction

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Proceedings Article | 27 April 2023 Presentation + Paper

EPE-aware process optimization for scanner dose and overlay in DRAM use case

Inho Kwak, Nanhyung Kim, Inbeom Yim, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Pieter Brandt, Kateryna Lyakhova, Marco Mueller, Ferhad Kamalizadeh, Antonio Corradi, Yun-A Sung, Thomas Kim, Stefan Smith-Meerman, Stefan van der Sanden, Sung-Min Park, Bob Boo, Hyok-Man Kwon

Proceedings Volume 12496, 124960N (2023) https://doi.org/10.1117/12.2658274

KEYWORDS: Scanners, Overlay metrology, Semiconducting wafers, Lithography, Metrology, Dysprosium, Distributed interactive simulations, Design and modelling, Critical dimension metrology, Yield improvement

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Proceedings Article | 27 April 2023 Presentation + Paper

Using active asymmetry control and blind source separation to improve the accuracy of after develop overlay measurements

Jungmin Lee, Doogyu Lee, Eunji Lee, Inbeom Yim, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Marc Noot, Arno van Leest, Simon Mathijssen, Yao Gao, Seung-Bin Yang, Mi-Yeon Baek, Do-Haeng Lee, Han-Gyeol Park, Jong-Hyuk Yim, Thomas Kim, Ho-Hyuk Lee, Kemal Dahha, Stefan Smith-Meerman, Koen van Witteveen, Elliott McNamara, Matthew McLaren

Proceedings Volume 12496, 124960H (2023) https://doi.org/10.1117/12.2658330

KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Matrices, Polarization, Wafer testing, Signal processing, Independent component analysis, Education and training, Diffraction

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Proceedings Article | 26 May 2022 Presentation + Paper

Improved multi-lot overlay performance via phase-based ADI overlay measurements

Doogyu Lee, Jungmin Lee, Eunji Lee, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Pieter Kapel, Seung-Bin Yang, Mi-Yeon Baek, Jeroen Wefers Bettink, Se-Ra Jeon, Thomas Kim, Aileen Soco, Olger Zwier, Koen van Witteveen

Proceedings Volume 12053, 1205316 (2022) https://doi.org/10.1117/12.2627719

KEYWORDS: Overlay metrology, Diffraction gratings, Semiconducting wafers, Phase measurement, Phase shifts, Diffraction, Optical testing, Optical metrology, Optical design, Etching

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Proceedings Article | 26 May 2022 Presentation + Paper

Absolute overlay measurement based on voltage contrast defect inspection with programmed misalignments for DRAM devices

Moosong Lee, Jinsun Kim, Dohyeon Park, Yeeun Han, Junseong Yoon, Seung Yoon Lee, Chan Hwang, Achim Woessner, Cyrus Tabery, Miao Wang, Antonio Corradi, Young-Hoon Song, Yun-A Sung, Thomas Kim, Aileen Soco, Jason Kim, Chih-Hung Hsieh

Proceedings Volume 12053, 1205315 (2022) https://doi.org/10.1117/12.2626721

KEYWORDS: Overlay metrology, Semiconducting wafers, Defect inspection, Metrology, Inspection, Standards development, Image processing, Electronics, Etching, Electrons

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Proceedings Article | 20 March 2020 Paper

Enabling accurate and robust optical metrology of in device overlay

Min-Seok Kang, Chan Hwang, Seungyoon Lee, Jeongjin Lee, Joon-Soo Park, Christian Leewis, Eun-Ji Yang, Do-Haeng Lee, James Lee, Sabil Huda, Noh-Kyoung Park, Anagnostis Tsiatmas, Giulio Bottegal, Amy Wang, Filippo Belletti, Jan Jitse Venselaar, Giacomo Miceli, Izabela Saj, Sam Chen

Proceedings Volume 11325, 1132529 (2020) https://doi.org/10.1117/12.2553446

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Measurement devices, Optical metrology, Etching, Scanners, Diffractive optical elements, Wafer testing, Optical testing

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Proceedings Article | 20 March 2020 Presentation + Paper

Novel on-product focus metrology for EUV enabling direct focus monitoring and control for EUV systems

Inbeom Yim, Koshiba Dakeshi, Chan Hwang, Seung Yoon Lee, Jeongjin Lee, Joonsoo Park, Jenny Yueh, Ali Ghavami, Bart Segers, Miguel Garcia Granda, Yutao Gui, Eric Janda, Frank Staals, Se-Hui Lee, Seung-Bin Yang, Yoon-Tae Lee, Se-Ra Jeon, Daniel Park, Ewoud van West, Elliott McNamara

Proceedings Volume 11325, 113251U (2020) https://doi.org/10.1117/12.2553246

KEYWORDS: Metrology, Extreme ultraviolet, Semiconducting wafers, Control systems, Scanners, Logic, Extreme ultraviolet lithography, Deep ultraviolet, Diffraction

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Proceedings Article | 20 March 2020 Presentation + Paper

Understanding advanced DRAM edge placement error budget and opportunities for control

Jaeseung Jeong, Jinho Lee, Jinsun Kim, Sunyoung Yea, Chan Hwang, Seung Yoon Lee, Jeongjin Lee, Joonsoo Park, Peter Nikolsky, Daniel Park, Antonio Corradi, Hyun-Woo Yu, Sun-Wook Jung, Denis Ovchinnikov, Vadim Timoshkov, Isabel de la Fuente Valentin, Yuxiang Yin, Kaustubh Padhye, Wim Tel, Harm Dillen, Koen Thuijs, Daan Slotboom, Miao Wang, Rhys Su, Marc Kea, Jin-Woo Lee, Yun-A Sung, Sang-Uk Kim, Young-Hoon Song, James Lee, Oh-Sung Kwon

Proceedings Volume 11325, 1132506 (2020) https://doi.org/10.1117/12.2551997

KEYWORDS: Metrology, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Optical lithography, Etching, Lithography, Edge roughness

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Proceedings Article | 20 March 2020 Presentation + Paper

Taking the multi-wavelength DBO to the next level of accuracy and robustness

Jinsun Kim, Jeongijn Lee, Chan Hwang, Seung Yoon Lee, Wooyoung Jung, Joonsoo Park, Kaustuve Bhattacharyya, Arie den Boef, Simon Mathijssen, Marc Noot, Farzad Farhadzadeh, Daniel Park, Kaustubh Padhye, Se-Ra Jeon, Seung-Bin Yang, Won-Jae Jang, Oh-Sung Kwon

Proceedings Volume 11325, 113251J (2020) https://doi.org/10.1117/12.2551676

KEYWORDS: Overlay metrology, Semiconducting wafers, Calibration, Metrology, Diffraction gratings, Polarization, Optical testing, Etching, Electronics, Optical lithography

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Proceedings Article | 20 March 2018 Presentation + Paper

Smart overlay metrology pairing adaptive deep learning with the physics-based models used by a lithographic apparatus

Chan Hwang, Seung Yoon Lee, SeungHwa Oh, Emil Schmitt-Weaver, Jeonghyun Park, Daniel Park, Mohamed El Kodadi, Kaustuve Bhattacharyya

Proceedings Volume 10587, 105870B (2018) https://doi.org/10.1117/12.2297513

KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Data modeling, Lithography, Optical alignment, Instrument modeling, Physics, Computing systems, Nanofabrication

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Proceedings Article | 24 March 2016 Paper

A study of swing-curve physics in diffraction-based overlay

Kaustuve Bhattacharyya, Arie den Boef, Greet Storms, Joost van Heijst, Marc Noot, Kevin An, Noh-Kyoung Park, Se-Ra Jeon, Nang-Lyeom Oh, Elliott McNamara, Frank van de Mast, SeungHwa Oh, Seung Yoon Lee, Chan Hwang, Kuntack Lee

Proceedings Volume 9778, 97781I (2016) https://doi.org/10.1117/12.2222040

KEYWORDS: Accuracy assessment, Overlay metrology, Physics, Image processing, Process control, Optical properties, Polarization, Metrology, Inspection, Diffraction gratings, Semiconducting wafers, Computer simulations, Diffraction, Detection theory

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Proceedings Article | 8 March 2016 Paper

Metrology target design simulations for accurate and robust scatterometry overlay measurements

Guy Ben-Dov, Inna Tarshish-Shapir, David Gready, Mark Ghinovker, Mike Adel, Eitan Herzel, Soonho Oh, DongSub Choi, Sang Hyun Han, Mohamed El Kodadi, Chan Hwang, Jeongjin Lee, Seung Yoon Lee, Kuntack Lee

Proceedings Volume 9778, 97783B (2016) https://doi.org/10.1117/12.2219108

KEYWORDS: Overlay metrology, Metrology, Critical dimension metrology, Scatterometry, Optical testing, Image processing, Scatter measurement, Optical metrology, Diffraction gratings, Diffraction, Semiconducting wafers, Wafer testing, Device simulation

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Proceedings Article | 2 April 2014 Paper

The effect of individually-induced processes on image-based overlay and diffraction-based overlay

SeungHwa Oh, Jeongjin Lee, Seungyoon Lee, Chan Hwang, Gilheyun Choi, Ho-Kyu Kang, EunSeung Jung

Proceedings Volume 9050, 905039 (2014) https://doi.org/10.1117/12.2046583

KEYWORDS: Overlay metrology, Chemical mechanical planarization, Semiconducting wafers, Metals, Image processing, Diffraction, Statistical analysis, Statistical modeling, Error analysis, Electronics

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Proceedings Article | 10 April 2013 Paper

Advanced overlay stability control with correction per exposure on immersion scanners

Jinkyu Han, Jinseok Heo, Chan Hwang, Jeongho Yeo

Proceedings Volume 8681, 86811D (2013) https://doi.org/10.1117/12.2011379

KEYWORDS: Semiconducting wafers, Overlay metrology, Scanners, Control systems, Process control, Instrument modeling, Lithography, Fourier transforms, Electronics, Semiconductors

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Proceedings Article | 3 April 2012 Paper

Feasibility study of matched machine overlay enhancement toward next-generation device development

Jeongjin Lee, Seungyoon Lee, Chan Hwang

Proceedings Volume 8324, 832419 (2012) https://doi.org/10.1117/12.916968

KEYWORDS: Scanners, Semiconducting wafers, Distortion, Extreme ultraviolet lithography, Overlay metrology, Extreme ultraviolet, Data modeling, Data corrections, Lithography, Photomasks

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Proceedings Article | 20 April 2011 Paper

Reduction of SEM noise and extended application to prediction of CD uniformity and its experimental validation

Hoyeon Kim, Chan Hwang, Seok-hwan Oh, Jeongho Yeo, Young hee Kim

Proceedings Volume 7971, 79710K (2011) https://doi.org/10.1117/12.879590

KEYWORDS: Line width roughness, Scanning electron microscopy, Critical dimension metrology, Inspection, Photoresist materials, Image processing, Denoising, Semiconducting wafers, Data modeling, Metrology

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Proceedings Article | 20 April 2011 Paper

Investigation on accuracy of process overlay measurement

Chan Hwang, Jeongjin Lee, Seungyoon Lee, Jeongho Yeo, Yeonghee Kim, Hongmeng Lim, Dongsub Choi

Proceedings Volume 7971, 79711F (2011) https://doi.org/10.1117/12.880299

KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Image processing, Scanners, Photoresist processing, Inspection, Nondestructive evaluation, Photomasks, Signal processing

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Proceedings Article | 2 April 2010 Paper

A novel robust diffraction-based metrology concept for measurement and monitoring of critical layers in memory devices

Boo-Hyun Ham, Hyun-Jea Kang, Chan Hwang, Jeong-Ho Yeo, Cheol-Hong Kim, Suk-Woo Nam, Joo-Tae Moon, Martyn Coogans, Arie den Boef, Chan-Ho Ryu, Stephen Morgan, Andreas Fuchs

Proceedings Volume 7638, 76381S (2010) https://doi.org/10.1117/12.848399

KEYWORDS: Overlay metrology, Semiconducting wafers, Diffraction, Diffraction gratings, Metrology, Oxides, Scatterometry, Lithography, Image processing, Photoresist processing

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Proceedings Article | 24 March 2009 Paper

CD budget analysis on sub-50-nm DRAM device: global CD variation to local CD variation

Chan Hwang, Joon-Soo Park, Jeongho Yeo, Seong-Woon Choi, Chan-Hoon Park

Proceedings Volume 7272, 72722O (2009) https://doi.org/10.1117/12.814476

KEYWORDS: Critical dimension metrology, Photomasks, Scanning electron microscopy, Metrology, Error analysis, Line width roughness, Semiconducting wafers, Statistical analysis, Scanners, Computer simulations

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Proceedings Article | 26 March 2007 Paper

A method for generating assist-features in full-chip scale and its application to contact layers of sub-70-nm DRAM devices

Dong-Woon Park, Sangwook Kim, Chan Hwang, Sukjoo Lee, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 6520, 652028 (2007) https://doi.org/10.1117/12.713055

KEYWORDS: Optical proximity correction, Model-based design, Photomasks, Lithography, Semiconducting wafers, Light sources, Image quality, Manufacturing, Optical simulations, Reliability

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Proceedings Article | 24 March 2006 Paper

Investigation on polarization monitoring mask: pattern design and experimental verification

Chan Hwang, Dong-Woon Park, Jang-Ho Shin, Dong-Seok Nam, Suk-Joo Lee, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 6152, 61521M (2006) https://doi.org/10.1117/12.657054

KEYWORDS: Polarization, Photomasks, Polarizers, Semiconducting wafers, Diffraction, Optical lithography, Lithographic illumination, Reticles, Critical dimension metrology, Printing

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Proceedings Article | 12 May 2005 Paper

Measurement technique of nontelecentricity of pupil-fill and its application to 60 nm NAND flash memory patterns

Jangho Shin, SukJoo Lee, Hochul Kim, Chan Hwang, SeongSue Kim, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598655

KEYWORDS: Fiber optic illuminators, Reticles, Semiconducting wafers, Image sensors, Photoresist materials, Overlay metrology, Optical lithography, Scanners, Optics manufacturing, Metrology

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Proceedings Article | 12 May 2005 Paper

Requirement of in-field illumination control for low k1 imaging below 0.3

Chan Hwang, Jangho Shin, Suk-Joo Lee, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599532

KEYWORDS: Critical dimension metrology, Error analysis, Lithographic illumination, Error control coding, Control systems, Optical lithography, Imaging systems, Computer simulations, Lithography, Optical proximity correction

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Proceedings Article | 28 May 2004 Paper

Impact of illumination intensity profile on lithography simulation

Chan Hwang, In-sung Kim, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536356

KEYWORDS: Lithographic illumination, Lithography, Monochromatic aberrations, Critical dimension metrology, Optical proximity correction, Optical components, Optical lithography, Computing systems, Mathematical modeling, Holographic optical elements

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Proceedings Article | 28 May 2004 Paper

Layer-specific illumination for low k1 periodic and semiperiodic DRAM cell patterns: design procedure and application

Chan Hwang, Dong-Seok Nam, Jin-Hong Park, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536362

KEYWORDS: Optical lithography, Genetic algorithms, Computing systems, Computer simulations, Optimization (mathematics), Image enhancement, Resolution enhancement technologies, Optical resolution, Light sources, Optical proximity correction

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Proceedings Article | 28 May 2004 Paper

A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns

Sook Lee, Chan Hwang, Dong-Woon Park, In-Sung Kim, Ho-Chul Kim, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536280

KEYWORDS: Calibration, Lithography, Scanning electron microscopy, Data conversion, Refractive index, Device simulation, Diffusion, Scanners, Instrument modeling, Nanoimprint lithography

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Proceedings Article | 29 April 2004 Paper

Advanced module-based approach to effective CD prediction of sub-100nm patterns

Jangho Shin, Insung Kim, Chan Hwang, Dong-Woon Park, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han, Joo-Tae Moon

Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.536345

KEYWORDS: Photomasks, Diffusion, Convolution, Lithography, Lithographic illumination, Semiconductors, Image sensors, Semiconducting wafers, Scanners, Electron beams

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Proceedings Article | 26 June 2003 Paper

Process latitude extension in low-k1 DRAM lithography using specific layer-oriented illumination design

Young Kang, Dong-Seok Nam, Chan Hwang, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485384

KEYWORDS: Lithographic illumination, Diffraction, Double patterning technology, Monte Carlo methods, Lithography, Resolution enhancement technologies, Image processing, Semiconducting wafers, Optical lithography, Image storage

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Proceedings Article | 26 June 2003 Paper

Layer-specific illumination optimization by Monte Carlo method

Ho-Chul Kim, Dong-Seok Nam, Chan Hwang, Young Kang, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485383

KEYWORDS: Monte Carlo methods, Lithographic illumination, Spectrum analysis, Resolution enhancement technologies, Critical dimension metrology, Lithography, Double patterning technology, Scanners, Image enhancement, Electronics

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Showing 5 of 31 publications

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