Dr. Chandra Saru Saravanan
Principal Scientist at Nanometrics Inc
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | April 1, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Metrology, 3D modeling, Scatterometry, 3D metrology, Double patterning technology, Optical proximity correction, Critical dimension metrology, Scatter measurement, Overlay metrology

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Diffraction, Spectroscopy, Silicon, Reflectivity, Scatterometry, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology, Diffraction gratings

PROCEEDINGS ARTICLE | March 22, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Diffraction, Metrology, Optical lithography, Spectroscopy, Silicon, Photoresist materials, Scatterometry, Double patterning technology, Critical dimension metrology, Overlay metrology

PROCEEDINGS ARTICLE | April 4, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Mathematical modeling, Monochromatic aberrations, Reticles, Cadmium, Scanners, Scatterometry, Finite element methods, Critical dimension metrology, Semiconducting wafers, Fused deposition modeling

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Metrology, Cadmium, Spatial frequencies, Scanners, Scatterometry, Immersion lithography, Modulation transfer functions, Critical dimension metrology, Semiconducting wafers

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