Dr. Chandrasekhar Sarma
Program Manager at
SPIE Involvement:
Senior status | Conference Program Committee | Author
Area of Expertise:
Program management/customer interface , OPC/DFM/LFD , Semiconductor Technology , Lithography Process , EUV , DSA
Publications (21)

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Oxides, Lithography, Optical lithography, Deep ultraviolet, Nanoparticles, Metals, Ultraviolet radiation, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 4, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Thin films, Lithography, Photoresist materials, Silicon films, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Semiconducting wafers, Photolysis, Tin

PROCEEDINGS ARTICLE | April 4, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Calibration, Metals, Photons, Photoresist materials, Extreme ultraviolet, Absorbance, Bismuth, Chlorine, Post-transition metals

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Polymethylmethacrylate, Data modeling, Scatterometry, Bridges, Directed self assembly, Picosecond phenomena, Critical dimension metrology, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Deep ultraviolet, Electrons, Photomasks, Extreme ultraviolet, Transistors, Extreme ultraviolet lithography, Optical proximity correction, Nanoimprint lithography, Critical dimension metrology, Fin field effect transitor

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Calibration, Diffusion, Computer simulations, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Showing 5 of 21 publications
Conference Committee Involvement (1)
Novel Patterning Technologies 2018
26 February 2018 | San Jose, California, United States
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