Dr. Chang Ho Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | August 27, 2009
Proc. SPIE. 7415, Organic Light Emitting Materials and Devices XIII
KEYWORDS: Oxides, Thin films, Optical lithography, Cell phones, Organic light emitting diodes, Metals, Glasses, LCDs, Display technology

PROCEEDINGS ARTICLE | November 8, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Electronics, Scattering, Diffusion, Photomasks, Optical proximity correction, Critical dimension metrology, Applied physics, Semiconducting wafers, Chemically amplified resists

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Optical properties, Polymers, Diffusion, Photoresist materials, Photomasks, Absorbance, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Optical properties, Polymers, Diffusion, Photoresist materials, Photomasks, Absorbance, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Polymers, Glasses, Diffusion, Atomic force microscopy, Scanning electron microscopy, Photoresist materials, Line edge roughness, Photoresist developing, Temperature metrology

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top