Chang-Hwan Kim
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (14)

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004)
KEYWORDS: Chromium, Photomasks, Resolution enhancement technologies, Optical alignment, Laser processing, Semiconducting wafers, Phase shifts, Lithography, Logic devices, Control systems

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004)
KEYWORDS: Polymers, Mask making, Lithography, Chemistry, Line edge roughness, Photomasks, Electron beam lithography, Reticles, Polymethylmethacrylate, Extreme ultraviolet lithography

Proceedings Article | 28 August 2003 Paper
Sungmin Huh, JoHyung Park, Dong-Hoon Chung, Chang-Hwan Kim, In-Kyun Shin, Sung-Woon Choi, Jung-Min Sohn
Proceedings Volume 5130, (2003)
KEYWORDS: Photomasks, Inspection, Quartz, Dry etching, Finite-difference time-domain method, Lithography, Defect inspection, Semiconducting wafers, Mask making, Defect detection

Proceedings Article | 11 March 2002 Paper
Proceedings Volume 4562, (2002)
KEYWORDS: Critical dimension metrology, Photomasks, Photoresist processing, Scanning electron microscopy, Scattering, Standards development, Phase shifts, Semiconducting wafers, Printing, Optics manufacturing

Proceedings Article | 11 March 2002 Paper
Proceedings Volume 4562, (2002)
KEYWORDS: Etching, Chromium, Critical dimension metrology, Photomasks, Oxygen, Plasma etching, Dry etching, Mask making, Plasma, Optical proximity correction

Showing 5 of 14 publications
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