Chang-Il Oh
Senior Member/Technical Staff at SK Hynix Inc
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Optical lithography, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Double patterning technology, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Absorption

Proceedings Article | 20 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Reticles, Lithographic illumination, Image processing, Scanning electron microscopy, Optical proximity correction, Photoresist processing, Semiconducting wafers, Standards development, Resolution enhancement technologies

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Resistance, Electroluminescence, Photomasks, Image enhancement, Photoresist processing, Semiconducting wafers

Proceedings Article | 26 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Optical lithography, Etching, Scanners, Materials processing, Bridges, Photomasks, Line width roughness, Immersion lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Optical lithography, Deep ultraviolet, Scanners, Silicon, Laser scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Carbon, Lithography, Etching, Chemical species, Dry etching, Polymers, Resistance, Chemical vapor deposition, Plasma etching, Plasma

Showing 5 of 8 publications
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